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99.99995% Trimethylgallium 1445-79-0

99.99995% Trimethylgallium 1445-79-0

Trimethylgallium, often abbreviated as TMG or TMGa, is an organogallium compound with the chemical formula Ga(CH3)3.  This compound is a colorless, pyrophoric liquid that exhibits a monomeric structure, in contrast to trimethylaluminium.       

                                                                                                                           

Trimethylgallium serves as a widely utilized metalorganic source of gallium in metalorganic vapor phase epitaxy (MOVPE), a process critical for the synthesis of gallium-containing compound semiconductors employed in the fabrication of optoelectronic devices and solar panels.

 


Trimethylgallium

Synonyms Trimethylgallane, Trimethanidogallium,Gallium, Trimethyl-EINECS 215-897-6
Cas No. 1445-79-0
Chemical formula Ga(CH3)3
Molar mass 114.827 g/mol
Appearance Colourless liquid
Melting point −15 ℃ (5 ℉; 258K)
Boiling point 55.7 ℃ (132.3 ℉; 328.8K)
Solubility in water Reacts with water

 

Trimethylgallium (TMG) is a clear, colorless, pyrophoric liquid that spontaneously ignites upon exposure to air. TMG is known to react violently with water and other compounds capable of donating labile or active hydrogen (i.e., protons).  

 

TMG must be handled with extreme care and caution. It should be stored in a cool, dry environment at temperatures ranging from 0 to 25 ℃ under an inert atmosphere. Storage temperatures must not exceed 40 ℃ to prevent deterioration.

 

Enterprise specification of 99.99995%Trimethylgallium - Low silicon content(6N5 TMGa-Low Si)

Element Result Specification Element Result Specification Element Result Specification
Ag ND <0.03 Co ND <0.02 Pb ND <0.03
Al ND <0.03 Cr ND <0.02 S ND <0.05
As ND <0.03 Cu ND <0.02 Sb ND <0.05
Au ND <0.02 Fe ND <0.04 Si ND <0.02
B ND <0.03 Ge ND <0.05 Sn ND <0.05
Ba ND <0.02 Hg ND <0.03 Sr ND <0.03
Be ND <0.02 La ND <0.02 Ti ND <0.05
Bi ND <0.03 Mg ND <0.02 V ND <0.03
Ca ND <0.03 Mn ND <0.03 Zn ND <0.03
Cd ND <0.02 Ni ND <0.03      

 

Note:

Above all value ppm by weight on metal,and ND=not detected

Analysis Method:ICP-MS

FT-NMR results(LOD for FT-NMR organic and oxygenated impurity is O.1ppm)

Oxygen guarantee <0.5ppm(measured in FT-NMR)

1.No Organic impurities detected

2.No Oxygenated impurities detected

 

What is Trimethylgallium used for?

Trimethylgallium (Ga(CH3)₃), also abbreviated as TMG or TMGa, is the preferred metalorganic source of gallium for the metalorganic vapor phase epitaxy (MOVPE) process in the synthesis of gallium-containing compound semiconductors, including but not limited to GaAs, GaN, GaP, GaSb, InGaAs, InGaN, AlGaInP, InGaP, AlInGaNP, and Ga2O3. These metalorganic sources are utilized for the preparation of various gallium-containing compound semiconductors, such as:  

- Gallium arsenide (GaAs), widely employed in space applications and as a material for blue light-emitting diodes (LEDs) based on gallium nitride (GaN).  

- Gallium phosphide (GaP) and gallium antimonide (GaSb), which play critical roles in the fabrication of optoelectronic devices.  

Copper indium gallium sulfide (CIGS) and copper indium gallium selenide, used in the manufacture of high-efficiency solar panels.  

 

Additionally, TMG is employed in the preparation of thin films of gallium-based semiconductor materials, such as GaAs, GaN, and GaP thin films, which are integral components in microelectronics and high-speed device applications.

 

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